新規高分子およびそれを用いたナノ多孔性低誘電性高分子複合体の製造方法

Japanese Patent JP4343949

B2

A star-shaped polymer having an alkoxy silane end group and containing an ether group at the center thereof, which is represented by formula (I), is useful as a pore introducer to obtain a low dielectric silicate polymer film having nano-pores distributed regularly and evenly. The star-shaped polymer is prepared by comprising conducting a ring open polymerization of a cyclic monomer and a polyhydric alcohol, and reacting the resulting polymer with an alkoxy silane compound.

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JP2004168831	UNSATURATED POLYESTER RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME, AND THERMOSETTING MOLDING MATERIAL USING THE SAME AND PLASTIC MOLDED ARTICLE
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Li, Monthor
Oh, Wante
Hwang, Young-tech
Byung-du

JP2006515337A

October 14, 2009

February 17, 2004

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Postec Foundation

C08G63/91; C08F283/00; C08F283/06; C08F283/12; C08G65/336; C08G69/48; C08G77/42; C08J9/26

JP2003040998A
JP4298528A
JP2003141956A
JP2000169759A
JP2005517794A
JP2005505665A
JP2005515283A
JP2004536929A
JP2003246851A
JP2002268227A
JP2002167438A
JP8143818A
JP6271772A
JP4339833A

Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama

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