Title:
セファロスポリン抗生物質の製造における新規な塩
Document Type and Number:
Japanese Patent JP4856795
Kind Code:
B2
Abstract:
Compounds of general formula (II), wherein R1 represents R4 represents hydrogen or —CHO group, R5 represents hydrogen or trityl, R2 represents hydrogen or methoxy group, R3 represents —CH═CH2 or and M represents a dialkyl or dicycloalkyl ethylenediamine group selected from N,N′-diisobutylethylenediamine, N,N′-dicyclohexylethylenediamine, and N,N′-dicyclopentylethylenediamine, are useful in a process to make cephalosporin antibiotics of formula (I) wherein R represents hydrogen or pharmaceutically acceptable esters or alkali metals salts.
Inventors:
Sen Silk Mar Udayan Parayan Paranisami
Lakshmi Patty Venu Sanjeevi
Andrew Ganaplakersham
Chandra Sekaran Ramsubb
Nagendel Lao Dingdigara
Homme Lady Gaddam
Lakshmi Patty Venu Sanjeevi
Andrew Ganaplakersham
Chandra Sekaran Ramsubb
Nagendel Lao Dingdigara
Homme Lady Gaddam
Application Number:
JP2007519899A
Publication Date:
January 18, 2012
Filing Date:
July 04, 2005
Export Citation:
Assignee:
ORCHID CHEMICALS & PHARMACEUTICALS LIMITED
International Classes:
C07D501/36; C07D501/22
Domestic Patent References:
| JPS5677284A | 1981-06-25 |
Foreign References:
| WO2004035800A2 | 2004-04-29 | |||
| US4058661A | 1977-11-15 |
Attorney, Agent or Firm:
Hiroyuki Kurihara