Title:
New sulfonium salt, its manufacturing method, and a photo-oxide generating agent
Document Type and Number:
Japanese Patent JP6055666
Kind Code:
B2
Abstract:
A sulfonium salt compound represented by the following general formula (I): where R1 and R2 each denote the same or a different alkyl group having 1 to 18 carbon atoms, R3 and R4 each denote the same or a different alkyl group having 1 to 10 carbon atoms, X− denotes a sulfonate anion or a carboxylate anion, and the substituents denoted by R3O and R4O are each located at an arbitrary position selected from the 2-position to the 8-position of the naphthyl group.
Inventors:
Hiroki Kinoshita
Junji Kisanuki
Masaaki Sugi
Takataka Mori
Junji Kisanuki
Masaaki Sugi
Takataka Mori
Application Number:
JP2012268079A
Publication Date:
December 27, 2016
Filing Date:
December 07, 2012
Export Citation:
Assignee:
dsp Gokyo Food & Chemical Co., Ltd.
Tokyo Ohka Kogyo Co., Ltd.
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C07C381/12; C07C61/13; C07C61/135; C07C309/25; C09K3/00
Domestic Patent References:
JP2004334060A | ||||
JP2006276755A | ||||
JP2005099556A |
Foreign References:
WO2003010603A1 | ||||
WO2014087998A1 |
Attorney, Agent or Firm:
Noboru Fujimoto
Hiroaki Nakatani
Hiroaki Nakatani
Previous Patent: The mounting method and surface mount machine of electronic parts
Next Patent: JPS6055667
Next Patent: JPS6055667