Title:
NOVEL SULFONIUM-SALT-TYPE POLYMERIZABLE MONOMER, POLYMER PHOTOACID GENERATOR, BASE REIN, RESIST COMPOSITION, AND PATTERNING PROCESS
Document Type and Number:
Japanese Patent JP2023169814
Kind Code:
A
Abstract:
To provide a resist composition that has excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as LWR, as well as exhibits resistance to pattern collapse even in fine pattern formation; a polymer contained in the resist composition; a monomer that yields the polymer; and a patterning process using the resist composition.SOLUTION: The present invention provides a sulfonium-salt-type polymerizable monomer represented by the following formula (1) (where p is an integer of 1-3; R11 is a C1-20 hydrocarbyl group; Rf is a fluorine atom, a C1-6 fluorine atom-containing alkyl group, an alkoxy group, or a sulfide group; RALU is an acid-labile group; R12 is a C1-20 hydrocarbyl group; and A-X- is a non-nucleophilic counterion containing a polymerizable group A).SELECTED DRAWING: Figure 1
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Inventors:
FUKUSHIMA MASAHIRO
HATAKEYAMA JUN
HASEGAWA KOJI
HATAKEYAMA JUN
HASEGAWA KOJI
Application Number:
JP2022081150A
Publication Date:
November 30, 2023
Filing Date:
May 17, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08F220/10; C07C309/12; C07C381/12; C07D307/00; C07D333/76; C08F212/04; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toru Otsuka
Toshihiro Kobayashi
Toru Otsuka
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