NEW SULFUR-CONTAINING COMPOUND COMPRISING ETHYLENICALLY UNSATURATED GROUP, AND ITS POLYMER

Title:

NEW SULFUR-CONTAINING COMPOUND COMPRISING ETHYLENICALLY UNSATURATED GROUP, AND ITS POLYMER

Document Type and Number:

Japanese Patent JP2009137868

Kind Code:

A

Abstract:

To provide a new sulfur-containing compound, and a radiation-curable composition obtained by using the same yielding a cured material having a high reflective index and a high Abbe number.

Disclosed are a sulfur-containing compound comprising an ethylenically unsaturated group obtained by causing a new sulfur-containing compound represented by formula (1) to react with a compound comprising an ethylenically unsaturated group, and its polymer.

Inventors:

OKUTSU RIE
ANDO SHINJI
UEDA MITSURU
SUGAWARA SHUICHI

Application Number:

JP2007314695A

Publication Date:

June 25, 2009

Filing Date:

December 05, 2007

Export Citation:

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Assignee:

JSR CORP
TOKYO INST TECH

International Classes:

C07D339/06; C08F20/38

Attorney, Agent or Firm:

Kihei Watanabe

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