Title:
フォトリソグラフィのための非反射性コーティングおよびそれの製造方法
Document Type and Number:
Japanese Patent JP2005509913
Kind Code:
A
Abstract:
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
Inventors:
Baldwin, Teresa
Kennedy, joseph
Iwamoto, Nancy
Nakano, Tadashi
Bedwell, William
Stack, jason
Herbert, Mellow
Pseudo Mayer, Ahrain
Kennedy, joseph
Iwamoto, Nancy
Nakano, Tadashi
Bedwell, William
Stack, jason
Herbert, Mellow
Pseudo Mayer, Ahrain
Application Number:
JP2003545712A
Publication Date:
April 14, 2005
Filing Date:
November 12, 2002
Export Citation:
Assignee:
Honeywell International Inc.
International Classes:
G03F7/075; C03C17/00; C03C17/30; C07F7/18; C08G77/04; C08G77/12; C08K5/00; C08L83/00; C08L101/00; C09D5/00; C09D7/12; C09D183/04; C09D183/06; C09D183/08; G02B1/11; G03F7/09; G03F7/11; H01L21/027; (IPC1-7): G03F7/11; C08K5/00; C08L83/00; C08L101/00; H01L21/027
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Tadahiko Kurita
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Tadahiko Kurita