Title:
NONLINEAR ELEMENT
Document Type and Number:
Japanese Patent JPH0440426
Kind Code:
A
Abstract:
PURPOSE:To obtain the nonlinear element which has stable characteristics with a low defective rate by using a lower electrode which is tapered for the nonlinear element. CONSTITUTION:A metallic chromium thin film is formed on a glass substrate 1 by sputtering and resist is applied; and then photopatterning is performed to size larger than desired element size and a lower electrode is formed by dry etching to obtain the tapered lower electrode 12 of size corresponding to the specific element size. On the substrate where the lower electrode is formed, a silicon dioxide film is formed by a VCD method to <=100Angstrom film thickness, thus forming a nonlinear electric conductive induction layer 13 Consequently, the element has resistance to high electric field intensity, so the nonlinear element which is hardly broken electrostatically and has stable characteristics can be obtained.
Inventors:
SUGIYAMA ATSUSHI
Application Number:
JP14808990A
Publication Date:
February 10, 1992
Filing Date:
June 06, 1990
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G02F1/136; G02F1/1365; H01L49/02; (IPC1-7): G02F1/136; H01L49/02
Attorney, Agent or Firm:
Kisaburo Suzuki (1 outside)
Next Patent: JPH0440427