Title:
NOVEL ACID-LABILE POLYMER AND RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3793453
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer.
SOLUTION: This acid-labile polymer is represented by the formula 1 wherein R1, R2 and R6 are each a 1-34C alkyl group, alkoxymethylene group, alkoxyethylene group or the like; R5 is a hydrogen atom, a 1-18C alkyl or alkoxy group; R7 is a hydrogen atom, a 1-18C alkyl group, an alkyl group containing a 1-18C alkoxy or ester group; R3 and R4 are each a hydrogen atom, hydroxy group, nitrile group, 1-18C alkylcarbonyloxy group, 1-18C alkyl group or the like; X is a 1-40C olefin derivative, 1-40C vinyl ether derivative or 1-40C styrene derivative.
Inventors:
Park joheeon
Theo Dong Chu
Rim Young Taek
Selection
Joe Hyunsang
Kim seong goju
Theo Dong Chu
Rim Young Taek
Selection
Joe Hyunsang
Kim seong goju
Application Number:
JP2001376255A
Publication Date:
July 05, 2006
Filing Date:
December 10, 2001
Export Citation:
Assignee:
Korea Kumho Petrochemical Co.,Ltd.
International Classes:
C08F222/00; G03F7/004; C08F8/12; C08F222/06; C08F232/00; G03F7/039; H01L21/027; (IPC1-7): C08F222/00; C08F8/12; G03F7/039; H01L21/027
Domestic Patent References:
| JP11327147A | ||||
| JP2001125271A | ||||
| JP2001194794A | ||||
| JP2002047317A |
Attorney, Agent or Firm:
Masayuki Masabayashi