Title:
NOVEL ACRYLATE OR METHACRYLATE
Document Type and Number:
Japanese Patent JP2005298517
Kind Code:
A
Abstract:
To provide an acrylate or methacrylate useful as a monomer component for manufacturing an acrylate or methacrylate copolymer which has high transparency to ArF excimer laser, excellent sensitivity, resist pattern form, dry etching resistance and adhesion, high affinity with alkalis, and is suitable for a resin component of a chemically-amplified photoresist composition which can give a good resist pattern by paddle development.
The acrylate or methacrylate is represented by the general formula (wherein R1 is H or a methyl group). The acrylate or methacrylate of the present invention is useful as a raw material for manufacturing the copolymer suitable for the resin component of the chemically-amplified resist.
Inventors:
HANEDA HIDEO
SATO KAZUFUMI
KOMANO HIROSHI
SATO KAZUFUMI
KOMANO HIROSHI
Application Number:
JP2005160656A
Publication Date:
October 27, 2005
Filing Date:
May 31, 2005
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/039; C07D307/33; (IPC1-7): C07D307/33; G03F7/039
Attorney, Agent or Firm:
Aun Agata
Takatoshi Mizuguchi
Takatoshi Mizuguchi