Title:
自己免疫疾患の処置のための新規のヘテロアリールヘテロシクリル化合物
Document Type and Number:
Japanese Patent JP7434186
Kind Code:
B2
Abstract:
The present invention relates to compounds of formula (I), ab (I), wherein R1 to R3 and L are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.
Inventors:
Fabian
Ko, Bouyu
Riu, Hysia
Shen, Hong
One, Shaochin
Chan, Weishin
Chan, Jisen
Chan, Ji Wei
Ju, Way
Ko, Bouyu
Riu, Hysia
Shen, Hong
One, Shaochin
Chan, Weishin
Chan, Jisen
Chan, Ji Wei
Ju, Way
Application Number:
JP2020567201A
Publication Date:
February 20, 2024
Filing Date:
June 11, 2019
Export Citation:
Assignee:
F. HOFFMANN-LA ROCHE AKTIENGESELLSCHAFT
International Classes:
C07D413/14; A61K31/5377; A61K31/5383; A61K31/5386; A61K31/551; A61P13/12; A61P29/00; A61P37/06; A61P43/00; C07D471/04; C07D487/04; C07D498/10; C07D513/04; C07D519/00
Domestic Patent References:
| JP2021527100A | ||||
| JP2016535003A | ||||
| JP2018537501A |
Attorney, Agent or Firm:
Patent Attorney Corporation Tsukuni
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