Title:
NOVEL ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
Document Type and Number:
Japanese Patent JP2020111564
Kind Code:
A
Abstract:
To provide, in photolithography that uses a high energy beam such as KrF excimer laser beam, ArF excimer laser beam, an electron beam, extreme-ultraviolet light and so on as a light source, a novel onium salt used in a chemically amplified resist composition having small acid diffusion with high sensitivity and excellent lithography performance such as exposure latitude, a mask error factor, and line window stiffness, and a chemically amplified resist composition containing the onium salt as a photoacid generator, and a patterning process that uses the chemically amplified resist composition.SOLUTION: An onium salt represented by the following formula (1).SELECTED DRAWING: None
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Inventors:
FUKUSHIMA MASAHIRO
OHASHI MASAKI
KATAYAMA KAZUHIRO
OHASHI MASAKI
KATAYAMA KAZUHIRO
Application Number:
JP2019223533A
Publication Date:
July 27, 2020
Filing Date:
December 11, 2019
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C07D307/00; C07D327/06; C07D333/76; C07D495/08; C08F12/22; C08F22/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20; G03F7/32
Domestic Patent References:
| JP2017019997A | 2017-01-26 | |||
| JP2011126869A | 2011-06-30 | |||
| JP2017054116A | 2017-03-16 |
Foreign References:
| WO2012033145A1 | 2012-03-15 |
Attorney, Agent or Firm:
Hideaki International Patent Office