NEW MATERIAL:A compound expressed by formula I (R1WR5 and R1'WR5' are H, halogen amino, methoxyl, OH, hydroxy lower alkyl, etc.; at least one selected from the group consisting of R1WR5 and R1'WR5' is OH, and another one is hydroxy lower alkyl).
USE: A raw material for polyurethane resins capable of giving the polyurethane resins having improved light resistance.
PROCESS: An aromatic diamine compound expressed by formula II is subjected to the ordinary diazotation reaction and converted into a tetraazo compound expressed by formula III (X is halogen), which is then coupled with a phenolic compound expressed by formula IV to initiate the coupling of one of the diazo groups and give a diazonium salt compound expressed by formula V or an ionic dissociation product thereof. The coupling of the other diazo group is then initiated to afford the aimed compound expressed by formula I .
AMIYA SHIGETOSHI
HIRAI KOUJI
OKA MASAYA
WATANABE MUTSUJI
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