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Title:
NOVOLAC TYPE PHENOLIC HYDROXYL GROUP-CONTAINING RESIN AND RESIST MATERIAL
Document Type and Number:
Japanese Patent JP2017088675
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a novolac type phenolic hydroxyl group-containing resin excellent in heat resistance, transparency and light transmitting property, and a resist material having high resolution and excellent alkali developability.SOLUTION: The novolac type phenolic hydroxyl group-containing resin is obtained by using, as an intermediate in a production stage, a triaryl methane type compound in which all of three aryl groups have a phenolic hydroxyl group, together with a triaryl methane type compound in which two of three aryl groups have a phenolic hydroxyl group, and by introducing an acid dissociable protective group into the intermediate. The resist material is obtained by using the above resin. In the novolac type phenolic hydroxyl group-containing resin, at least one hydrogen in phenolic hydroxyl groups substituting a phenyl in the structural skeleton is substituted replaced by a tertiary alkyl, alkoxy alkyl, acyl, heterocyclic hydrocarbon, trialkylsilyl or the like.SELECTED DRAWING: None

Inventors:
SATO YUSUKE
IMADA TOMOYUKI
Application Number:
JP2015217612A
Publication Date:
May 25, 2017
Filing Date:
November 05, 2015
Export Citation:
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Assignee:
DAINIPPON INK & CHEMICALS
International Classes:
C08G8/20; G02B5/20; G03F7/023; G03F7/032
Domestic Patent References:
JPH0532751A1993-02-09
JP2008138128A2008-06-19
JP2014211517A2014-11-13
JP2014227464A2014-12-08
JPH0210348A1990-01-16
JP2000007729A2000-01-11
Foreign References:
WO2014141740A12014-09-18
WO2015141427A12015-09-24
Attorney, Agent or Firm:
Kono Tsuyo