To provide a nozzle cleaning device capable of uniformly polishing (cleaning) the nozzle in a short period time.

The nozzle cleaning device cleaning the nozzle E is equipped with a disc-shape brush unit U having a brush (b) implanted on the top surface, and a rotating and revolving mechanism K which rotates the brush and revolves it around the axis line of the nozzle E. The revolving radius L of the brush unit U is set to be not larger than the radius of the brush unit U. The brush unit U rotates and revolves to continuously clean the nozzle E by always sliding the nozzle E while changing the angle relative to the nozzle E. Therefore, the contact distance (the contact distance between the brush and the nozzle) per unit of time can be lengthened and the nozzle E can be uniformly cleaned in a short period time.