Title:
NOZZLE UNIT, LIQUID PROCESSING APPARATUS, AND LIQUID PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2021176188
Kind Code:
A
Abstract:
To improve the uniformity of temperature distribution in a substrate surface.SOLUTION: A nozzle unit is a unit for a liquid processing apparatus by which a liquid process using a solution is performed on a substrate. This nozzle unit includes a gas nozzle 46 including a discharge channel 56 for circulating gas, and a discharge port 52 for discharging the gas flowing in the discharge channel toward a surface of a substrate. The discharge port is formed so as to extend in a first direction Y along the surface. The width of the discharge channel in the first direction increases toward the discharge port so that the gas from the discharge port is discharged radially.SELECTED DRAWING: Figure 7
Inventors:
MIURA TAKUYA
TANAKA KOICHIRO
TAKAHASHI SHOGO
MIYAKUBO YUSUKE
YOSHIHARA KENTARO
TANAKA KOICHIRO
TAKAHASHI SHOGO
MIYAKUBO YUSUKE
YOSHIHARA KENTARO
Application Number:
JP2020167147A
Publication Date:
November 04, 2021
Filing Date:
October 01, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/027; B05B1/04; B05B1/14; B05C11/08; B05D3/00; B05D3/04; H01L21/304
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Shigeki Matsuo
Yoshiki Kuroki
Junji Kashiwaoka
Shigeki Matsuo
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