Title:
対物レンズ及び顕微鏡
Document Type and Number:
Japanese Patent JP5888509
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an objective lens having a structure that successfully provides effective darkfield epi-illumination by reducing loss in light volume even in a lens system having a high numerical aperture and a long working distance, and to provide a microscope including the objective lens.SOLUTION: An objective lens 30 is installed to a microscope 1, and has a darkfield illumination optical system 35 which applies light beams substantially parallel to an optical axis AX of an objective optical system 31 to a sample 16 via an optical path 33 arranged to surround the objective optical system 31. The darkfield illumination optical system 35 includes: a first optical component 36 which has positive refractive power at least in a radial direction of a circle having its center at the optical axis AX, and which focuses the light beams in the radial direction, so as to form a light focus point; and a second optical component 37 which deflects, in an optical axis direction, the light beams diverged from the light focus point, so as to apply the light beams to the sample 16.
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Inventors:
Kaori Mukai
Application Number:
JP2012188230A
Publication Date:
March 22, 2016
Filing Date:
August 29, 2012
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G02B21/02; G02B13/18; G02B21/10
Domestic Patent References:
| JP200019412A | ||||
| JP200223061A | ||||
| JP57150812A |
Attorney, Agent or Firm:
Hoyo Joyo