Title:
OBSCURE MASK FOR PHOTOGRAPHYING OVAL GRATED SHADOW MASK PATTERN
Document Type and Number:
Japanese Patent JPS5519791
Kind Code:
A
Abstract:
PURPOSE: To facilitate the photographying of oval grated shadow mask pattern by rotating a obscure board formed with optical wedge then exposing to a photosensitive material.
CONSTITUTION: Obscure board 13 formed with transparent or reflective optical wedge 12 is rotated around the highest density section 14 in said optical wedge 12, while concave or convex deformed lenz 16 is placed in front of said opeical wedge 12 and the rotating optical wedge 12 is exposed through deformed lenz 16 by means of makeup camera. The optical wedge increases the density toward the center.
Inventors:
SHIRAKAWA KAZUO
Application Number:
JP8846479A
Publication Date:
February 12, 1980
Filing Date:
July 12, 1979
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03B27/32; H01J9/00; H01J9/14; H01J29/07; (IPC1-7): H01J9/00; H01J29/07