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Title:
OMNIDIRECTION SIMULTANEOUS VAPOR-DEPOSITION POLYMERIZER
Document Type and Number:
Japanese Patent JP3833275
Kind Code:
B2
Abstract:

PURPOSE: To conduct vapor deposition with the deposition rate increased and the polymer film thickened by fixing plural couples of monomer vessels to a vacuum deposition polymerization chamber through an inlet pipe and forming the polymer films on the entire surface of a material to be deposited.
CONSTITUTION: Two couples of monomer vessels 5a and 5b (only one couple shown in the figure) are connected to a vapor-deposition polymerization chamber 1 through valves 18a and 18b and inlet pipes 6a and 6b. A material to be deposited is placed in a barrel 10 in the chamber 1, and, for example, 4,4'- diaminodiphenyl ether is filled in one couple of the monomer vessels 5a and 5b and pyromellitic dianhydride in another couple of the monomer vessels. The barrel 10 is rotated with a motor 11, the chamber is evacuated to a specified pressure with an exhaust pipe 2, the chamber 1, inlet pipes 6a and 6b and exhaust pipe 2 are respectively heated with an embedded heater 13, the valves 18a and 18b are simultaneously opened, and a polyimide film is formed on the entire surface of the material. Consequently, the deposition rate is increased, and the formed polymer film is thickened.


Inventors:
Masayuki Iijima
Application Number:
JP2341494A
Publication Date:
October 11, 2006
Filing Date:
January 24, 1994
Export Citation:
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Assignee:
ULVAC, Inc.
International Classes:
C08F2/00; C23C14/12; C08F2/34; C08G85/00; H01L21/312; (IPC1-7): C23C14/12; C08F2/00; C08F2/34; C08G85/00; H01L21/312
Domestic Patent References:
JP4173963A
JP63207124A
JP7102364A
Attorney, Agent or Firm:
Yasuo Iisaka