オニウム塩、化学増幅ネガ型レジスト組成物及びレジストパターン形成方法

Title:

オニウム塩、化学増幅ネガ型レジスト組成物及びレジストパターン形成方法

Document Type and Number:

Japanese Patent JP7310724

Kind Code:

B2

Abstract:

An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

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Inventors:

Naoya Inoue
Satoshi Watanabe
Ryosuke Taniguchi
Masahiro Fukushima

Application Number:

JP2020097357A

Publication Date:

July 19, 2023

Filing Date:

June 04, 2020

Export Citation:

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Assignee:

Shin-Etsu Chemical Co., Ltd.

International Classes:

C07C25/02; C07C309/42; C07C211/63; C07C381/12; C07D327/08; C07D333/76; C09K3/00; G03F7/004; G03F7/038; G03F7/20

Domestic Patent References:

JP2005120047A
JP2019204048A
JP2019203103A
JP2016065016A
JP2021187808A
JP2017513966A

Attorney, Agent or Firm:

Patent Attorney Corporation Eimei International Patent Office

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