Title:
オニウム塩化合物、化学増幅レジスト組成物及びパターン形成方法
Document Type and Number:
Japanese Patent JP7363742
Kind Code:
B2
Abstract:
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.
Inventors:
Noriyuki Fujiwara
Kenichi Oikawa
Tomohiro Kobayashi
Masahiro Fukushima
Kenichi Oikawa
Tomohiro Kobayashi
Masahiro Fukushima
Application Number:
JP2020180100A
Publication Date:
October 18, 2023
Filing Date:
October 28, 2020
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C69/92; C07C25/00; C07C69/80; C07C69/90; C07C381/12; C07D333/76; G03F7/004; G03F7/038; G03F7/039; G03F7/20; G03F7/32
Domestic Patent References:
| JP2015169790A | ||||
| JP2017120370A | ||||
| JP2016108525A | ||||
| JP2019003176A | ||||
| JP2017058454A |
Foreign References:
| WO2019187445A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office