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Title:
OPTICAL DEVICE CAPABLE OF ADJUSTING EFFECT OF FORCE UPON OPTICAL MODULE
Document Type and Number:
Japanese Patent JP2013225674
Kind Code:
A
Abstract:

To provide a connection device which achieves high imaging quality of a micro lithography device.

A plurality of connection units for connecting a support section of an optical module to a support structure are designed to give a supporting force to the support section in a predefined position of the support structure. The support section has a predefined desired geometrical shape while being supported by the support structure. At least one connection unit has at least one elastic element and generates a tuning supporting force in the state where the optical module is supported. The tuning supporting force is tuned to the supporting force of other remaining connection units by the at least one elastic element, such that a maximum positional displacement induced by deforming a point of the support section becomes preferably less than 100 nm or further preferably less than 10 nm or, in addition to or in place of this, such that a maximum angular displacement in the point of the support section becomes preferably less than 5 mrad or further preferably less than 2 mrad.


Inventors:
STEFAN SCHAFF
MARKUS KERN
Application Number:
JP2013088778A
Publication Date:
October 31, 2013
Filing Date:
April 19, 2013
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B7/02; G03F7/20
Domestic Patent References:
JP2010225896A2010-10-07
JP2011066211A2011-03-31
JP2009277685A2009-11-26
JP2006140366A2006-06-01
JP2008515219A2008-05-08
JP2011528181A2011-11-10
Foreign References:
WO2006038952A22006-04-13
WO2007040254A12007-04-12
WO2004019104A12004-03-04
Attorney, Agent or Firm:
Kenji Sugimura
Yamaguchi Yusuke
Keisuke Kawahara