Title:
OPTICAL ELEMENT AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JP3721815
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To produce an optical element and its manufacturing method, with a high degree of freedom of crystal structure and selectivity of its material, capable of forming a three-dimensional refractive index periodic structure.
SOLUTION: In this manufacturing method for an optical element, an Si thin film is coated on a substrate 10, the Si thin film is patterned to form thin films 120a, 120b together for each layer constituting an optical element. The patterned thin films 120a, 120b have patterns A, B respectively comprising hexagonal holes 121 displaced longitudinally and transversely by a pitch p/2 relative to each other. The thin film 120a of the pattern A and the thin film 120b of the pattern B are laminated and adhered alternately to obtain the optical element having a three-dimensional refractive index periodic structure with refractive index varying according to a change in the crystal structure.
Inventors:
Hidenori Yamada
Takayuki Yamada
Mutsuya Takahashi
Takayuki Yamada
Mutsuya Takahashi
Application Number:
JP35656598A
Publication Date:
November 30, 2005
Filing Date:
December 15, 1998
Export Citation:
Assignee:
Fuji Xerox Co., Ltd
International Classes:
B32B7/02; B29D11/00; B32B37/00; G02B1/02; G02B5/00; G02B5/18; G02B5/20; G02B5/28; G02B5/30; (IPC1-7): G02B1/02; B32B31/00; G02B5/18; G02B5/20
Domestic Patent References:
| JP11316154A | ||||
| JP53050464A | ||||
| JP2000056146A |
Foreign References:
| US5600483 |
Attorney, Agent or Firm:
Tadao Hirata