To provide an optical element having high optical characteristics.
The optical element includes a dielectric layer 2 on a principal surface of a light-transmitting substrate 1, and a plurality of projections 11 formed on the dielectric layer 2, the projections having a width smaller than a wavelength of visible light. The projections 11 include a metal layer 3 comprising Al on the dielectric layer 2, and a mask layer 4 formed of SiO2 or a cermet containing SiO2, contacting an upper face of the metal layer 3. By providing the mask layer 4 comprising a dielectric material in contact with the metal layer 3, processing accuracy of the metal layer 3 can be kept high even when a resist mask used for the processing of the metal layer 3 has a low mask pattern height, and thereby, the obtained optical element has excellent optical characteristics.
KASAI JUNPEI
KISHI HIROYUKI
JP2008304522A | 2008-12-18 | |||
JP2010177133A | 2010-08-12 |