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Title:
OPTICAL IMAGING ARRANGEMENT
Document Type and Number:
Japanese Patent JP2013051424
Kind Code:
A
Abstract:

To provide an optical imaging arrangement which has good and long-term reliable imaging properties and is used in an EUV exposure process.

Provided is an optical imaging arrangement comprising: a mask unit 3; a substrate unit 4; an optical projection unit 2 comprising a group of optical element units and adapted to transfer an image of a pattern; a first imaging arrangement component which is a component of one of the optical element units; a second imaging arrangement component which is different from the first imaging arrangement component and is a component of one of the mask unit 3, the optical projection unit 2 and the substrate unit 4; and a metrology arrangement 10. The metrology arrangement 10 captures a spatial relationship between the first imaging arrangement component and the second imaging arrangement component. The metrology arrangement 10 comprises a reference element 10.2 connected mechanically and directly to the first imaging arrangement component.


Inventors:
KWAN YIM-BUN PATRICK
Application Number:
JP2012222394A
Publication Date:
March 14, 2013
Filing Date:
October 04, 2012
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
JP2004327807A2004-11-18
JP2004281654A2004-10-07
JP2000286189A2000-10-13
JP2005236258A2005-09-02
JP2002319535A2002-10-31
JPH07254555A1995-10-03
JPH01122119A1989-05-15
JP2004327807A2004-11-18
JP2000286189A2000-10-13
JP2002319535A2002-10-31
JP2004281654A2004-10-07
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi



 
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