To provide an optical imaging arrangement which has good and long-term reliable imaging properties and is used in an EUV exposure process.
Provided is an optical imaging arrangement comprising: a mask unit 3; a substrate unit 4; an optical projection unit 2 comprising a group of optical element units and adapted to transfer an image of a pattern; a first imaging arrangement component which is a component of one of the optical element units; a second imaging arrangement component which is different from the first imaging arrangement component and is a component of one of the mask unit 3, the optical projection unit 2 and the substrate unit 4; and a metrology arrangement 10. The metrology arrangement 10 captures a spatial relationship between the first imaging arrangement component and the second imaging arrangement component. The metrology arrangement 10 comprises a reference element 10.2 connected mechanically and directly to the first imaging arrangement component.
JP2004327807A | 2004-11-18 | |||
JP2004281654A | 2004-10-07 | |||
JP2000286189A | 2000-10-13 | |||
JP2005236258A | 2005-09-02 | |||
JP2002319535A | 2002-10-31 | |||
JPH07254555A | 1995-10-03 | |||
JPH01122119A | 1989-05-15 | |||
JP2004327807A | 2004-11-18 | |||
JP2000286189A | 2000-10-13 | |||
JP2002319535A | 2002-10-31 | |||
JP2004281654A | 2004-10-07 |
Groundwork Kenichi