Title:
薄膜ディスクまたはウェハーの光学検査方法
Document Type and Number:
Japanese Patent JP5016194
Kind Code:
B2
Abstract:
A method for measuring a defect on a surface of an object (4501), comprising:
directing a first light beam in a first plane of incidence toward a first position on the object (4501);
directing a second light beam in a second plane of incidence toward a second position on the object (4501), wherein the angle between the first plane of incidence and the second plane of incidence is zero and wherein the first light beam is directed in a circumferential direction (4504) and the second light beam is directed in a radial direction of said object (4501);
detecting a first scattered light beam; and
detecting a second scattered light beam; wherein the first scattered light beam comprises scattered light intensity from the first position and the second scattered light beam comprises scattered light intensity from the second position, the method further comprising a step of comparing the first scattered light beam and the second scattered light beam to determine a first aspect ratio of a defect on the surface of the object (4501).
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Inventors:
Steve W Meeks
Application Number:
JP2005001750A
Publication Date:
September 05, 2012
Filing Date:
January 06, 2005
Export Citation:
Assignee:
KLA-TENCOR CORPORATION
International Classes:
G01B11/30; G01B11/06; G01N21/95; G01N21/21; G01N21/47; G01N21/956; G11B5/84; H01L21/66; G01N21/958
Domestic Patent References:
| JP11173994A | ||||
| JP3141974B2 | ||||
| JP11515108A | ||||
| JP1245137A |
Attorney, Agent or Firm:
Meisei International Patent Office