To provide an optical mechanism for EUV lithography reducing deformation caused by an influence of a temperature, and to provide a method for constituting the optical mechanism having especially a projection lens and an optical element.
This optical mechanism includes a second mirror 22 including a reflection surface 31a and a substrate 32 constituted of TiO2-doped quartz glass having a temperature-dependent thermal expansion coefficient having zero crossing at a first zero-cross temperature TZC1, and a second optical element including a reflection surface and a second substrate constituted of TiO2-doped quartz glass having a temperature-dependent thermal expansion coefficient having zero crossing at a second zero-cross temperature which is different from the first zero-cross temperature, wherein the gradient (ΔCTE1>) of the thermal expansion coefficient of the first substrate 32 at the first zero-cross temperature and/or the gradient (ΔCTE2) of the thermal expansion coefficient of the second substrate at the second zero-cross temperature have a negative sign, respectively.
| JP2007524214A | 2007-08-23 | |||
| JP2006103988A | 2006-04-20 | |||
| JP2003303750A | 2003-10-24 | |||
| JP2006210404A | 2006-08-10 | |||
| JP2006194690A | 2006-07-27 | |||
| JP2007123874A | 2007-05-17 | |||
| JP2010163345A | 2010-07-29 | |||
| JP2010251801A | 2010-11-04 | |||
| JP2010537413A | 2010-12-02 | |||
| JP2012503319A | 2012-02-02 | |||
| JP2006156215A | 2006-06-15 |
| WO2010031526A1 | 2010-03-25 |
Groundwork Kenichi
Tsubouchi Shin