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Title:
光リソグラフィー用光学部材とその評価方法
Document Type and Number:
Japanese Patent JP4029838
Kind Code:
B2
Abstract:
A method of evaluating a refractive index homogeneity of an optical member for photolithography, the method comprising:a measurement step of transmitting light having a predetermined wavelength lambda through the optical member so as to measure a wavefront aberration;a Zernike fitting step of expanding thus measured wavefront aberration into a polynomial of a Zernike cylindrical function system;a first separating step of separating individual components of the polynomial into a rotationally symmetric element, an odd-symmetric element, and an even-symmetric element; anda second separating step of separating individual components of the polynomial into a plurality of parts according to a degree thereof.

Inventors:
Kazumasa Endo
Hiroyuki Hiraiwa
Kazuhiro Nakagawa
Mochida Masaaki
Application Number:
JP2003510913A
Publication Date:
January 09, 2008
Filing Date:
July 05, 2002
Export Citation:
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Assignee:
NIKON CORPORATION
International Classes:
G01N21/41; G01M11/00; G01M11/02; G02B13/24; G03F7/20; H01L21/027
Domestic Patent References:
JP2000121491A
JP10253346A
JP11002759A
JP8005505A
JP2001507463A
JP6109454A
Other References:
浅里幸起、香月良夫、清水岳男,高い天体追尾精度を実現する望遠鏡駆動制御技術,三菱電機技報,日本,1999年,第73巻、第12号,第835頁-第838頁,整理番号00A0126106
Attorney, Agent or Firm:
Yoshiki Hasegawa
Tatsuya Shioda
Shiro Terasaki