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Title:
OPTICAL METHOD FOR MEASURING ANGULAR POSITION OF FACET OF AT LEAST ONE FACET MIRROR FOR EUV USE, AND OPTICAL MEASUREMENT DEVICE
Document Type and Number:
Japanese Patent JP2014003290
Kind Code:
A
Abstract:

To provide an optical method for performing high accuracy measurement and setting of the angular position of a facet mirror for EUV use, and to provide an optical measurement device.

In the optical method for measuring the angular position of facets 16, 18 of at least one facet mirror 12, 14 in an optical system designed for EUV use, and then adjusting the angular position depending on the angular position thus measured, the facets 16, 18 of the facet mirrors 12, 14 are illuminated with measuring light, and the measuring light reflected on the facets 16, 18 is detected and evaluated for the purpose of registering the actual angular position. Thereafter, the angular position is adjusted if the actual angular position is deviated from a desired angular position. The optical method is designed so as to register the actual angular position of the facets 16, 18 by an angular position spectrum of at least ±10° with respect to the reference axis.


Inventors:
MATTHIAS MANGER
DANIEL RUNDE
ROLF FREIMANN
Application Number:
JP2013118086A
Publication Date:
January 09, 2014
Filing Date:
June 04, 2013
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B7/198; G02B19/00
Domestic Patent References:
JP2010518595A2010-05-27
Foreign References:
WO2012000528A12012-01-05
WO2010100078A12010-09-10
WO2011076500A12011-06-30
WO2010008993A12010-01-21
WO2011091900A22011-08-04
WO2011082872A12011-07-14
WO2011073039A22011-06-23
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Hitomi Yuki