OPTICAL PROXIMITY EFFECT CORRECTION METHOD UTILIZING PHASE-EDGE AS SUB-RESOLUTION ASSIST FEATURE

Title:

OPTICAL PROXIMITY EFFECT CORRECTION METHOD UTILIZING PHASE-EDGE AS SUB-RESOLUTION ASSIST FEATURE

Document Type and Number:

Japanese Patent JP3939234

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating the optical proximity effects.
SOLUTION: The mask has a plurality of resolvable features to be printed on the substrate and at least one non-resolvable proximity correction feature, where the non-resolvable proximity correction feature is a phase-edge.

More Like This:

JPH0774859	[Title of Invention] Mask Observation Device
JPS6098846	[Title of the device] Magnification measurement machine

Inventors:

Douglas Van Den Broke
Jay Fan Chen

Application Number:

JP2002320524A

Publication Date:

July 04, 2007

Filing Date:

September 27, 2002

Export Citation:

Click for automatic bibliography generation Help

Assignee:

AS M Mask Tools B.V.

International Classes:

G03F1/00; H01L21/027; G03F1/26; G03F1/34; (IPC1-7): G03F1/08; H01L21/027

Domestic Patent References:

JP10326005A
JP9152708A
JP2000214572A
JP7152144A
JP9127676A

Foreign References:

US5827625

Attorney, Agent or Firm:

Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Hideto Asamura
Hajime Asamura
Toru Mori
Yukio Iwamoto

Previous Patent: RECHARGEABLE MOVING TOY CHARGER

Next Patent: CENTRIFUGAL CASTING APPARATUS AND METHOD USED FOR THE SAME