Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
OPTICAL SYSTEM ESPECIALLY OF MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2013243357
Kind Code:
A
Abstract:

To provide the optical system of microlithography projection exposure apparatus which allows flexible setting of a different polarization distribution including a tangential/radial mixed polarization distribution.

A polarization-influencing optical device 150 includes at least one polarization-influencing optical element 200 composed of an optically active material having an optical crystal axis and having a thickness profile changing in the direction of optical crystal axis, at least one λ/2 plate 250, at least one rotor 240 which brings about rotation of a fixed polarization rotation angle in the polarization direction of light incident onto the rotor 240, and an actuator device capable of moving the λ/2 plate 250 and the rotor 240 independently from each other between a position on the inside of an optical beam path and a position on the outside thereof.


Inventors:
SAENGER INGO
Application Number:
JP2013097929A
Publication Date:
December 05, 2013
Filing Date:
April 16, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B5/30; G02B19/00; G03F7/20
Domestic Patent References:
JP2007527549A2007-09-27
JP2003532281A2003-10-28
JP2008047673A2008-02-28
JP2003532281A2003-10-28
JP2007527549A2007-09-27
JP2008047673A2008-02-28
Foreign References:
WO2005071718A12005-08-04
WO2011154227A12011-12-15
WO2005076045A12005-08-18
WO2011154227A12011-12-15
WO2005071718A12005-08-04
WO2005076045A12005-08-18
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi



 
Previous Patent: JP2013243356

Next Patent: SOLAR CELL AND MODULE THEREOF