To provide the optical system of microlithography projection exposure apparatus which allows flexible setting of a different polarization distribution including a tangential/radial mixed polarization distribution.
A polarization-influencing optical device 150 includes at least one polarization-influencing optical element 200 composed of an optically active material having an optical crystal axis and having a thickness profile changing in the direction of optical crystal axis, at least one λ/2 plate 250, at least one rotor 240 which brings about rotation of a fixed polarization rotation angle in the polarization direction of light incident onto the rotor 240, and an actuator device capable of moving the λ/2 plate 250 and the rotor 240 independently from each other between a position on the inside of an optical beam path and a position on the outside thereof.
JP2007527549A | 2007-09-27 | |||
JP2003532281A | 2003-10-28 | |||
JP2008047673A | 2008-02-28 | |||
JP2003532281A | 2003-10-28 | |||
JP2007527549A | 2007-09-27 | |||
JP2008047673A | 2008-02-28 |
WO2005071718A1 | 2005-08-04 | |||
WO2011154227A1 | 2011-12-15 | |||
WO2005076045A1 | 2005-08-18 | |||
WO2011154227A1 | 2011-12-15 | |||
WO2005071718A1 | 2005-08-04 | |||
WO2005076045A1 | 2005-08-18 |
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi