Title:
光学システム
Document Type and Number:
Japanese Patent JP5878169
Kind Code:
B2
Abstract:
To prevent reflective optical elements (2) for EUV lithography from becoming electrically charged as they are irradiated with EUV radiation (4), an optical system for EUV lithography is proposed, having a reflective optical element (2), including a substrate (21) with a highly reflective coating (22) emitting secondary electrons when irradiated with EUV radiation (4), and a source (3) of electrically charged particles, which is arranged in such a manner that electrically charged particles are applied to the reflective optical element (2), wherein the source (3) for the charge carrier compensation is exclusively a flood gun applying electrons to the reflective optical element (2).
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Inventors:
Dirk Heinrich Ame
Marx Weiss
Christoph Tsazek
Tobias Hackle
Wolfgang Zeitz
Marx Weiss
Christoph Tsazek
Tobias Hackle
Wolfgang Zeitz
Application Number:
JP2013514678A
Publication Date:
March 08, 2016
Filing Date:
June 14, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/08; G02B19/00
Domestic Patent References:
JP6267492A | ||||
JP2000047371A | ||||
JP2005326177A | ||||
JP2008263173A |
Foreign References:
US4680467 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Tsubouchi Shin
Groundwork Kenichi
Tsubouchi Shin