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Patent Searching and Data


Title:
光トンネル保持調整装置
Document Type and Number:
Japanese Patent JP2008506151
Kind Code:
A
Abstract:
A light tunnel retention and adjustment mechanism for retaining and aligning a light tunnel in a light tunnel assembly. The light tunnel retention and adjustment mechanism includes one or more first compliant spring fingers that interface with the light tunnel along a first surface to provide a compliant spring force for adjusting alignment of the light tunnel in a first axis and fixedly retaining the light tunnel in position in the first axis. The light tunnel retention and adjustment mechanism further includes one or more second compliant spring fingers that interface with the light tunnel along a second surface and provide a compliant spring force for adjusting alignment of the light tunnel in a second axis and fixedly retaining the light tunnel in position in the second axis. The light tunnel retention and adjustment mechanism may be formed as a single piece.

Inventors:
Takatoyo Kitamura
Stephen draw
Tuck Men Won
Application Number:
JP2007520296A
Publication Date:
February 28, 2008
Filing Date:
April 27, 2005
Export Citation:
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Assignee:
In focus corporation
International Classes:
G03B21/14; F16B9/02; F21V17/02; G02B7/18; G02B23/24
Domestic Patent References:
JP2004085780A2004-03-18
JP2002131840A2002-05-09
JPH08227034A1996-09-03
JPH0392508U1991-09-20
JPH0393005U1991-09-24
JPH0392510U1991-09-20
JPH10253923A1998-09-25
Attorney, Agent or Firm:
Takuji Yamada
Mitsuo Tanaka
Masahiro Ishino
Kawabata Junichi