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Title:
OPTICAL UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2009194159
Kind Code:
A
Abstract:

To provide an optical unit capable of contributing to the equalization of illumination distribution of light to be emitted, and to provide an illumination optical system, an exposure apparatus and a device manufacturing method.

A first optical unit 19 is provided on a light path of an exposure light EL output from an exposure light source. The first optical unit 19 includes a pair of micro-fly eye lenses 30, 31 disposed along the light path of the exposure light EL, and a plurality of lens planes 32, 33 formed in a Y-direction are formed on the surfaces of emission side of each of the micro-fly eye lenses 30, 31. Non-lens regions 34, 35 are formed between the lens planes 32, 33 adjacent to each other in the Y-direction. A plurality of light-shielding wire materials 40 disposed so as to abut to each of non-lens regions 35 are provided on the emission side of the micro-fly eye lens 31, and each light-shielding wire materials 40 shields the exposure light EL emitted from each non-lens region 35 individually corresponding thereto.


Inventors:
MURAMATSU KOJI
Application Number:
JP2008033390A
Publication Date:
August 27, 2009
Filing Date:
February 14, 2008
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B3/00; G02B3/06; G02B3/08; G02B5/00; G02B7/00; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda