To provide an optical unit capable of contributing to the equalization of illumination distribution of light to be emitted, and to provide an illumination optical system, an exposure apparatus and a device manufacturing method.
A first optical unit 19 is provided on a light path of an exposure light EL output from an exposure light source. The first optical unit 19 includes a pair of micro-fly eye lenses 30, 31 disposed along the light path of the exposure light EL, and a plurality of lens planes 32, 33 formed in a Y-direction are formed on the surfaces of emission side of each of the micro-fly eye lenses 30, 31. Non-lens regions 34, 35 are formed between the lens planes 32, 33 adjacent to each other in the Y-direction. A plurality of light-shielding wire materials 40 disposed so as to abut to each of non-lens regions 35 are provided on the emission side of the micro-fly eye lens 31, and each light-shielding wire materials 40 shields the exposure light EL emitted from each non-lens region 35 individually corresponding thereto.
JP2610815 | [Title of Invention] Exposure Method |
JP2002287330 | BLANK FOR PHOTOMASK AND PHOTOMASK |
JPH11159571 | MACHINE DEVICE, EXPOSURE DEVICE AND ITS OPERATING METHOD |
Makoto Onda