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Title:
OPTICALLY-FINISHED THIN DIAMOND SUBSTRATE OR WINDOW OF HIGH ASPECT RATIO AND METHOD OF PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JP2023113676
Kind Code:
A
Abstract:
To provide a large-area diamond film, window, or substrate that is thin and has optically-finished one side or both sides of a diamond surface.SOLUTION: In a method of forming a diamond film, substrate, or window, a silicon substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the silicon substrate. The grown diamond film, substrate, or window has an aspect ratio >100, wherein the aspect ratio is a ratio of the largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film. The silicon substrate can optionally be removed or separated from the grown diamond film, substrate, or window.SELECTED DRAWING: Figure 2

Inventors:
XU WEN-QING
LIU CHAO
ELGIN E EISSLER
GIOVANNI BARBAROSSA
CHARLES D TANNER
THOMAS E ANDERSON
Application Number:
JP2023080374A
Publication Date:
August 16, 2023
Filing Date:
May 15, 2023
Export Citation:
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Assignee:
COHERENT CORP
International Classes:
C30B29/04; C01B32/25; C30B25/18
Attorney, Agent or Firm:
Patent Attorney Corporation Fujimoto Partners