To provide a manufacturing condition optimization system for a diffraction optical element which can design the diffraction optical element with high performance adapted to manufacturing conditions.
The system is equipped with a setting process means 11 which sets initial values including target diffraction efficiency of the diffraction optical element and an irradiation quantity distribution in manufacturing, a predicted absorption quantity distribution generating means 12 which generates a predicted absorption quantity distribution of a sensitive substance layer from the irradiation quantity distribution, a predicted sectional shape generating means 13 which generates a predicted sectional shape when the sensitive substance layer having reacted by the irradiation is chemically processed according to the predicted absorption quantity distribution, a predicted diffraction efficiency generating means 14 which generates predicted diffraction efficiency according to the predicted sectional shape, a comparison judging means 15 which judges whether the irradiation quantity distribution is employed by comparing the predicted diffraction efficiency with the target diffraction efficiency, and an irradiation distribution updating means 16 which updates the irradiation quantity distribution; when it is judged that the irradiation quantity distribution is not employed, a series of the processes is repeated on the basis of the irradiation quantity distribution updated by the irradiation quantity updating means 16.
| WO/2008/017458 | ENCLOSED, BINARY TRANSMISSION GRATING |
| JPH11249077 | OPTICAL DISPLAY SYSTEM |
| JP2002535670 | [Title of Invention] Spectrophotometer |
HIRAI YOSHIHIKO
KIKUTA HISAO
OKANO MASATO
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