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Patent Searching and Data


Title:
ORGANIC THIN FILM AND FORMATION
Document Type and Number:
Japanese Patent JPS63305933
Kind Code:
A
Abstract:

PURPOSE: To prevent thermal decomposition of organic substance at a time of vapor deposition and to enhance the orientation properties and crystallizability of a thin film by dropping the prescribed amount of the organic substance on a previously heated vapor deposition boat and quickly evaporating it in vacuum and vapor-depositing it to form the organic thin film.

CONSTITUTION: The inside of a vacuum tank is regulated to about 10-8Torr degree of vacuum and Al is vapor-deposited at about thousands on a glass base plate 1 in a preliminary chamber 6 with a resistance heating vapor deposition device 2. Then after introducing oxygen and forming aluminum oxide with glow discharge, it is transferred to a formation chamber 5 of an organic thin film. Then argon atomic beams are subjected to impulse toward the base plate for vapor deposition from a generator of the atomic beams for shocking the base plate. The powder of N-salicylideneaniline-3-carboxylic acid is allowed to fall on a heated tungsten boat from a falling device 7 of organic substance and all amounts are quickly evaporated. Then after returning the base plate to the preliminary chamber 6, a lead electrode is vapor-deposited by using the resistance heating vapor deposition device 2.


Inventors:
EBISAWA FUMIHIRO
HORIUCHI TSUTOMU
TABEI HISAO
SUKEGAWA TAKESHI
Application Number:
JP13985887A
Publication Date:
December 13, 1988
Filing Date:
June 05, 1987
Export Citation:
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Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
C08F38/00; C23C14/12; C23C14/24; C30B29/54; H01L21/363; H01L51/05; H01L51/40; B01J19/08; (IPC1-7): B01J19/08; C08F38/00; C23C14/12; C23C14/24; C30B29/54; H01L21/363; H01L29/28
Attorney, Agent or Firm:
Hiroshi Nakamoto