PURPOSE: To improve light emission capability by providing such an organic electric-field luminescent thin-film layer that thin electron-conduction layers and hole-conductance layers are laminated alternately two or more and also by adding into one of those layers one out of alkaline metal, alkaline earth metal, halogen, and chalcogen.

CONSTITUTION: A transparent electrode 2 is formed on a glass base 1 with a magnetron sputter and then an electrode pattern is formed in a photo resist process and an etching process so as to obtain organic electric-field luminescent thin-film layer 4 with a ultra-high vacuum thin-film forming unit. The amount of Se evaporated is controlled so as to provide 0.5mol% of Se added, thus forming a 50 thick hole conduction layer 3a. Next, the amount of Na evaporated is controlled so as to provide about 1mol% of Na added, thus forming a 50 thick electron conduction layer 3b. This cycle is repeated 20times. Then a layer 4 has on its surface an Al electrode 5, which is finally covered by a device protecting resin 6 for completion. When a DC voltage of 10V was applied between the device electrodes, a luminescence of 200 to 300cd/m3 was observed with a current density of 0.8mA/cm2.