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Title:
ORGANOAMINODISILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2018195833
Kind Code:
A
Abstract:
To provide precursors for forming silicon-containing films, and methods for depositing films comprising the same.SOLUTION: The invention provides precursors of the formula I in the figure, where Ris a C-Calkyl group, alkenyl group or alkynyl group, a C-Cdialkylamino group, an electron withdrawing group, or a C-Caryl group; and Ris hydrogen, a C-Calkyl group, a C-Calkenyl group or alkynyl group, a C-Cdialkylamino group or fluorinated alkyl group, an electron withdrawing group, or a C-Caryl group.SELECTED DRAWING: None

Inventors:
XIAO MANCHAO
LEI XINJIAN
SPENCE DANIEL P
HAIRPIN CHANDRA
HAN BING
MARC O'NEAL LEONARD
MAYORGA STEVEN GERARD
ANUPAMA MALLIKARJUNAN
Application Number:
JP2018129282A
Publication Date:
December 06, 2018
Filing Date:
July 06, 2018
Export Citation:
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Assignee:
VERSUM MAT US LLC
International Classes:
H01L21/318; C07F7/02; C08G79/00; C23C16/42; C23C16/448; H01L21/205; H01L21/31; H01L21/316
Domestic Patent References:
JP2000195801A2000-07-14
JPH11147889A1999-06-02
JP2009516906A2009-04-23
JP2007509836A2007-04-19
JP2012025733A2012-02-09
Other References:
MARCUS SOLDNER, 外2名: "1,2-Disilanediyl Bis(triflate), F3CSO3-SiH2SiH2-O3SCF3, as the Key Intermediate for a Facile Prepara", INORGANIC CHEMISTRY, vol. 36, JPN6019019976, 1997, pages 1758 - 1763, ISSN: 0004238986
HEINZ SCHUH, 外3名: "Disilanyl-amines — Compounds Comprising the Structural Unit Si—Si—N, as Single-Source Precursors", ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, vol. 619, JPN7014001500, 1993, pages 1347 - 1352, XP002486454, ISSN: 0004044910, DOI: 10.1002/zaac.19936190805
Attorney, Agent or Firm:
Atsushi Aoki
Shinji Mitsuhashi
Kenji Kimura
Naori Kota
Kazuya Shiokawa



 
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