PURPOSE: To obtain the subject compound having useful properties such as light-resistance and water and oil repellency, exhibiting low surface tension, low refractive index, excellent chemical resistance, etc., and useful as a synthetic intermediate for pharmaceuticals, agricultural chemicals, etc., and an agent for improving the adhesiveness of a resist in the production of a semiconductor device.

CONSTITUTION: The compound of formula I [R is 1-10C alkyl, alkoxy, etc.; RF is (CF2)n1X (X is H, F, etc.; n1 is 1-10) or group of formula II (n2 is 0-8); m is 1-10]. For example, the compound of formula III or formula I can be produced on an industrial scale in one step at a low cost by compounding a compound of formula IV and a compound of formula V at a ratio of preferably 1:(1.2-5.0) and reacting at 0-100°C for 3-10hr. In the case of industrial production of the compound of formula I, preferably 1,1,2-trichlorotrifluoroethane is used as the reaction solvent and the amount of the compound of formula IV is adjusted to 0.5-30wt.% based on the total solution.