Title:
OXIDATION RESISTANT COMPONENT AND RELATED METHOD
Document Type and Number:
Japanese Patent JP2012007236
Kind Code:
A
Abstract:
To provide an oxidation resistant component and method for creating an aluminum diffusion surface layer within substantially nickel- and cobalt-free components.
An aluminum-containing slurry may be applied to a component. The component may then be heated to diffuse aluminum into the component and to form an aluminum diffusion surface layer 10 therein. The surface layer 10 may be characterized by an intermetallic aluminum-containing phase extending below the surface 12 of the component.
Inventors:
GOLLER GEORGE ALBERT
CAVANAUGH DENNIS WILLIAM
CAVANAUGH DENNIS WILLIAM
Application Number:
JP2011123024A
Publication Date:
January 12, 2012
Filing Date:
June 01, 2011
Export Citation:
Assignee:
GEN ELECTRIC
International Classes:
C23C10/48; C23C10/50; F01D5/28; F01D9/02; F01D25/00; F02C7/00
Domestic Patent References:
JPH08193257A | 1996-07-30 | |||
JPS5826432B2 | 1983-06-02 | |||
JPS55104472A | 1980-08-09 | |||
JPS4827056B1 | ||||
JPS5057037A | 1975-05-19 | |||
JP2010105029A | 2010-05-13 | |||
JP2002544396A | 2002-12-24 | |||
JPS61213367A | 1986-09-22 | |||
JPS5562158A | 1980-05-10 | |||
JP2004176086A | 2004-06-24 |
Foreign References:
WO2006077670A1 | 2006-07-27 |
Attorney, Agent or Firm:
Arakawa Satoshi
Hirokazu Ogura
Toshihisa Kurokawa
Hirokazu Ogura
Toshihisa Kurokawa
Previous Patent: ANODE FOR ELECTROLYSIS, AND MANUFACTURING METHOD THEREFOR
Next Patent: Ag-BASED SPUTTERING TARGET
Next Patent: Ag-BASED SPUTTERING TARGET