OXOALKYL GROUP-CONTAINING SULFONIUM SALT COMPOUND, RESIST COMPOSITION AND METHOD FOR FORMING PATTERN USING THE COMPOSITION

Title:

OXOALKYL GROUP-CONTAINING SULFONIUM SALT COMPOUND, RESIST COMPOSITION AND METHOD FOR FORMING PATTERN USING THE COMPOSITION

Document Type and Number:

Japanese Patent JP2001187780

Kind Code:

A

Abstract:

To obtain a photoacid generator having high transparency to exposure light and excellent sensitivity in a photoresist composition for lithography using far-ultraviolet light with wavelength of ≥130 nm and ≤220 nm.

This photoresist composition uses a sulfonium salt compound of general formula (1) (R1 and R2 are each independently an oxo group- containing straight-chain, branched chain or monocyclic or bridged cyclic alkyl group; R3 is a straight-chain, a branched chain, monocyclic or bridged cyclic alkyl group; and Y- is a counter ion) as a photoacid generator.

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Inventors:

IWASA SHIGEYUKI
MAEDA KATSUMI
NAKANO KAICHIRO
HASEGAWA ETSUO

Application Number:

JP37498199A

Publication Date:

July 10, 2001

Filing Date:

December 28, 1999

Export Citation:

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Assignee:

NEC CORP

International Classes:

C07C381/12; G03F7/004; G03F7/039; (IPC1-7): C07C381/12; G03F7/004

Attorney, Agent or Firm:

Nobuyuki Kaneda (2 others)

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