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Patent Searching and Data


Title:
PSM位置調整方法及び装置
Document Type and Number:
Japanese Patent JP2007501430
Kind Code:
A
Abstract:
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.

Inventors:
Estrem, Thomas
Zerne, Raul
Application Number:
JP2006522528A
Publication Date:
January 25, 2007
Filing Date:
August 03, 2004
Export Citation:
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Assignee:
Micronic Laser Systems Activora Get
International Classes:
G03F1/08; G02B26/08; G03C5/00; G03F7/20; G03F9/00; G06K9/00; H01L21/027
Domestic Patent References:
JP2003142379A2003-05-16
JP2005502909A2005-01-27
JP2001217180A2001-08-10
JPH1152541A1999-02-26
JP2003151888A2003-05-23
JPH0917714A1997-01-17
JP2002372790A2002-12-26
JP2001338858A2001-12-07
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Katsunori Shirae
Yutaka Yoshida