PARTIAL RESTORATION FOR CONDUCTIVE FILM

Japanese Patent JPS60220937

A

PURPOSE:To restore a local defective place of the fine conductive film of a wiring independently or continuously by a method wherein a deposition or an etching of the conductive film, which is performed on the basis of a laser induced chemical reaction, is carried out timewise and spatially in a limited extent. CONSTITUTION:Material gas is introudced in a reaction chamber 11 from a bomb 13 and a laser beam 7 is made to focus in the vicinity of the surface of a sample 6. Gas including an element to etch metals is selected for the material gas and when thelaser beam 7 of a wavelength coincident with the absorption band of the gas or a wavelength close contact to that of the gas is irradiated on the gas, the gas is decomposed and the conductive film of the sample can be etched. This chemical reaction can be attained by adjusting the beam radius in such a way that the beam radius covers an arbitrary position on the sample and by adjusting the irradiating time. Accordingly, the disconnection and short-circuit of fine conductive wires, which are constituted of various materials, can be continuously restored without inflicting damage to unnecessary parts of the substrate by a method that a conductive film is deposited on a defective place of the conductive films of the wires or an etching is performed on the defective place of the conductive film by making properly a selection of the material gas, a combination of the material gas and the laser beam and a selection of the laser wavelength.

NAKADA TOSHIKAZU
YAMAZAKI TOORU

JP7728184A

November 05, 1985

April 17, 1984

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CITIZEN WATCH CO LTD

C23F4/04; C23F1/02; H01L21/302; H01L21/3213; (IPC1-7): C23F4/00; H01L21/88

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