PURPOSE: To provide the particle detecting method of a vacuum device which can efficiently measure particles in a vacuum processing chamber with high accuracy and high reproducibility by using a particle detecting means inserted into an exhaust line.
CONSTITUTION: A dummy wafer W is placed on the surface of a lower electrode 3 so that the wafer W can cover the electrode 3. A gas is introduced into a vacuum processing chamber 1 toward the electrode 3 from the blowout nozzles 5 of a blowing-off means 4 which is in contact with an upper electrode 2 until the gas pressure in the chamber 1 becomes higher than the gas pressure used at the time of processing wafers. Then the gas pressure is maintained at the same level or lowered to a fundamental pressure. When the gas pressure is lowered, particles carried on a gas flow generated in an exhaust line 10 are detected by means of a particle detecting means 9.
| WO/2001/071348 | BIOLOGICAL PARTICLE SORTER |
| JP2526373 | DEVICE FOR MEASURING VOLUME AND REFRACTION FACTOR OF PARTICLES |
| JP4960772 | Particle counting method |
NAKADA SHIGENORI
KAMIYA SEISAKU
SATO SHINTARO
UCHIYAMA TAKAHIRO
