Title:
PARTICLE REMOVAL METHOD AND HEAT TREATMENT EQUIPMENT
Document Type and Number:
Japanese Patent JP2019057566
Kind Code:
A
Abstract:
To provide a particle removal method and heat treatment equipment, enabling a particle in a chamber to be removed with high accuracy.SOLUTION: A large amount of particles together with external atmosphere flow in a chamber 6 when the chamber 6 is opened for a maintenance or the like of heat treatment equipment 1. Inside of the chamber 6 converted into a sealed space after the completion of maintenance work is exhausted, and is change to a reduced-pressure atmosphere. Instantaneous gas expansion and subsequent gas shrinkage are repeatedly generated by irradiating the inside of the chamber 6 with flash light from a flash lump FL more than once with the inside of the chamber 6 changed to the reduced-pressure atmosphere. Thus, the particle which has adhered to the inside of the chamber 6 is scattered. The scattered particle is exhausted from the chamber 6, and accordingly the particle is removed.SELECTED DRAWING: Figure 1
Inventors:
FURUKAWA MASASHI
Application Number:
JP2017180195A
Publication Date:
April 11, 2019
Filing Date:
September 20, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/26; F27B17/00; F27D11/02
Domestic Patent References:
| JP2017045982A | 2017-03-02 | |||
| JP2005072291A | 2005-03-17 | |||
| JP2011097068A | 2011-05-12 | |||
| JP2013207033A | 2013-10-07 | |||
| JP2017045983A | 2017-03-02 |
Attorney, Agent or Firm:
Yoshitake Hidetoshi
Takahiro Arita
Takahiro Arita