Title:
PARTICULATE MATTER PROCESSING DEVICE CLEANING SYSTEM
Document Type and Number:
Japanese Patent JP2023130200
Kind Code:
A
Abstract:
To provide a particulate matter processing device cleaning system which can automatically clean the inside and outside of a device including an auxiliary facility thoroughly and efficiently.SOLUTION: A cleaning system 1 performs automatic cleaning processing of a device body of a pan coating device 2 and a liquid feed line 17 of coating liquid and an air supply and exhaust system members including an air supply duct 12 and the like. Spray nozzles 4 connected to the liquid feed line 17 and an in-pan cleaning nozzle 22 connected to a cleaning liquid supply line 30 are provided in a coating pan 3. Cleaning nozzles 21, 23-29 connected to the cleaning liquid supply line 30 are provided in a housing 5 or each air supply and exhaust system member. An ultra fine bubble generation device 31 is provided for the liquid feed line 17 and the cleaning liquid supply line 30. In cleaning processing, a cleaning liquid containing ultra fine bubbles with diameters less than 200 nm is supplied to the spray nozzles 4 and the respective cleaning nozzles 21-29.SELECTED DRAWING: Figure 1
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Inventors:
ISSHIKI TOSHIHIRO
KITAHARA JUMPEI
TAKEUCHI YUKI
KITAHARA JUMPEI
TAKEUCHI YUKI
Application Number:
JP2022034733A
Publication Date:
September 20, 2023
Filing Date:
March 07, 2022
Export Citation:
Assignee:
FREUNT IND CO LTD
International Classes:
B05B15/55; B01J2/00; B01J2/10; B01J2/16; B08B3/02
Attorney, Agent or Firm:
Yasushi Takano