Title:
リソグラフシステムのためのパターンデータ変換
Document Type and Number:
Japanese Patent JP5801289
Kind Code:
B2
Abstract:
A method and system for exposing a target according to pattern data in a maskless lithography machine generating a plurality of exposure beamlets for exposing the target. The method comprises providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to generate output pattern data. The output pattern data is supplied to the lithography machine, and the beamlets generated by the lithography machine are modulated on the basis of the output pattern data.
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Inventors:
Van de Peut, Theunis
Wieland, Marco Yang-Jako
Wieland, Marco Yang-Jako
Application Number:
JP2012511391A
Publication Date:
October 28, 2015
Filing Date:
May 17, 2010
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2006338000A | ||||
| JP2002534792A | ||||
| JP2000508839A | ||||
| JP2012511168A | ||||
| JP2008003504A | ||||
| JP2007517239A | ||||
| JP2005513770A |
Foreign References:
| WO2010063827A1 |
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa