Title:
PATTERN DEFECT CORRECTING DEVICE
Document Type and Number:
Japanese Patent JPS643661
Kind Code:
A
Abstract:
PURPOSE: To reduce the damage of a substrate by charged beams by heating the substrate in the middle of projecting charged beams or after projection.
CONSTITUTION: The substrate 10 is heated in the middle of projecting charged beams or after projection. A heating device 5 is installed beneath a moving stage 4. While the glass substrate 10 is heated, ion beams 8 are projected and scanned. Therefore, color centers, etc., disappear due to heat energy, and an organization is restored. Thus damages of the glass substrate 10, which are caused by ion injection, can be removed. Moreover the edge of an ion projection part is sharpened to obtain high image quality patterns at high accuracy.
Inventors:
TANAKA KAZUHIRO
Application Number:
JP15938687A
Publication Date:
January 09, 1989
Filing Date:
June 25, 1987
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G03F1/00; G03F1/72; G03F1/74; H01L21/027; H01L21/30; (IPC1-7): G03F1/00; H01L21/30
Domestic Patent References:
| JPS61123841A | 1986-06-11 | |||
| JPS586127A | 1983-01-13 | |||
| JPS5887128A | ||||
| JPS53135629A | 1978-11-27 | |||
| JPS60245227A | 1985-12-05 | |||
| JPS5787128A | 1982-05-31 |
Attorney, Agent or Firm:
Kenichi Hayase