Title:
PATTERN DESIGN SYSTEM BY PRESETTING OF WHOLE PATTERN OF SEWING ARTICLE, AND PARTING, CUTTING, MATCHMARK AND PERFORATION
Document Type and Number:
Japanese Patent JP2020190042
Kind Code:
A
Abstract:
To solve the problem that an extra cloth is wastefully used for pattern-matching in sewing a product, a plain or patterned cloth is required in a quantity larger than that required for cutting out each part for the size of a desired sewing article in sewing with a handicraft, pattern paper is to be prepared, and matchmark or perforation is to be performed to sew.SOLUTION: There is provided a pattern design system by presetting of the whole pattern of a sewing article, and parting, cutting, matchmark and perforation, in which the whole pattern displayed after sewing is preset; in each part to be distributed and represented by the setting, a pattern represented in the part and a place where outlining of the part, matchmark, and perforation are performed are set as one pattern; the one pattern is set as a part pattern; a design where a part pattern of a set of parts formed by the part patterns is efficiently arranged for each size is dyed; and thereby pattern-matching can be automatically performed without wasting a cloth, and a desired sewing article can be obtained.SELECTED DRAWING: Figure 10
Inventors:
KO MOTOSUKE
NAKASHIZUKA TENSHI
NAKASHIZUKA RIN
NAKASHIZUKA KARIN
NAKASHIZUKA TENSHI
NAKASHIZUKA RIN
NAKASHIZUKA KARIN
Application Number:
JP2019094194A
Publication Date:
November 26, 2020
Filing Date:
May 19, 2019
Export Citation:
Assignee:
ANGELING KENKYUSHO KK
International Classes:
A41H43/00; A41H3/00; D06H7/00