To highly accurately and speedily evaluate pattern shapes by a simple constitution.
The contour of a pattern P2 to be evaluated is detected. The contour of a reference pattern RP2 to be a criterion of evaluation of the pattern P2, an reference pattern to which an allowed value L is previously given, is detected. An allowable range AS2 of the pattern P2 is created on the basis of both the contour of a reference pattern RP2 and the allowable value L. Then by determining the relative locational relation between the detected contour of the pattern P2 and the allowable range AS2, the inclusion relation between the contour of the pattern P2 and the allowable range is determined. On the basis of determination results, the quality of the pattern P2 is determined.
| JP2000058410A | 2000-02-25 | |||
| JPH08194734A | 1996-07-30 | |||
| JPH10111108A | 1998-04-28 | |||
| JP2002277236A | 2002-09-25 | |||
| JPS5528112A | 1980-02-28 |
Hidetoshi Tachibana
Yasukazu Sato
Hiroshi Yoshimoto
Yasushi Kawasaki
Hakozaki Yukio